A cikin kera wafer na semiconductor, tsarin lithography mataki ne mai mahimmanci, wanda ke da daidaito wanda ke ƙayyade yawan amfani da guntu. A matsayin "tushen fallasa da ɗaukar hoto" a cikin tsarin ƙera wafer, lithography ya ƙunshi dukkan aikin aiki - gami da rufewa mai juyawa, fallasa, haɓakawa, etching, da tsaftacewar danshi - kuma yana sanya buƙatu masu tsauri kan tsaftar muhalli, sarrafa ƙazanta, kariyar lantarki, da juriya ga sinadarai. Ƙwayoyin ƙura na matakin micron, ƙaurawar ion mai alama, da fitarwar lantarki na ɗan lokaci duk na iya haifar da lahani kai tsaye na photoresist, rashin daidaiton tsari, oxidation na wafer, da ƙananan da'irori a cikin da'irori, wanda ke haifar da wargaza dukkan wafers ɗin kuma yana haifar da asarar samarwa mai yawa. FABs da yawa suna gwagwarmaya don inganta yawan amfani da hanyoyin photolithography. Ko da lokacin da kayan aiki, tsari, da sigogin muhalli duk suna cikin tsari, ƙalubalen sau da yawa yana cikin abubuwan da ba su da mahimmanci na kariya ta hannu. Safofin hannu na yau da kullun na aji 1,000 ko safofin hannu na masana'antu ba su dace da ƙa'idodin aikin photolithography masu matuƙar girma ba.
Me Yasa Amfani da Safofin Hannu na Tsabtace Ɗakin Aski Ya Haramta a Tsarin Lithography?
Ragowar foda yana haifar da gurɓatar photoresist
Yawan sinadarin sulfur da chloride suna lalata da'irori a kan wafers ɗin
Wutar lantarki mai tsayayye ta ɓace, wanda ya haifar da lalacewa a cikin daidaitaccen wafer na photolithography
Fashewa da zubar da jini, wanda ke haifar da lahani ga abubuwan waje a cikin tsarin ƙera su
Safofin hannu na LjieClean Class 100 marasa foda
Jagoran Suzhou yana mai da hankali kan ɓangaren kera wafer na semiconductor da kuma magance matsalolin da ke tattare da tsarin lithography, mun ƙirƙiro safofin hannu na musamman na Class 100 marasa foda, waɗanda ba sa fitar da iskar gas mai yawa waɗanda suka dace da buƙatun samarwa na tsarin lithography na wafer gaba ɗaya, wanda hakan ya sa suka zama abubuwan kariya da aka fi so ga kamfanonin da ke yin faci da gwajin wafer da yawa.
1. Tsarin Ba Ya Dauke da Foda Mai Tushen Dichloride: Babu Gurɓatar Foda a Tsarin Photolithography
Ta hanyar amfani da tsarin tsarkake sinadarin chlorine na musamman na semiconductor, wannan hanyar ba ta buƙatar ƙarin ƙarin abubuwa kamar talc, masara, ko man silicone a duk tsawon aikin. Tana tabbatar da amfani da shi cikin sauƙi ta hanyar aikin kanta, tana kawar da ƙwayoyin foda da ragowar man silicone waɗanda ke gurɓata photoresist a tushen, ta haka ne za a magance matsalolin ƙwayoyin cuta na waje gaba ɗaya a cikin aikin photolithography.
2 Ruwan wanke-wanke mai matakai da yawa yana haifar da ƙarancin sulfur, ƙarancin chlorine, da ƙarancin ion
Ta hanyar zagaye-zagaye da yawa na kurkurewar ruwa mai tsafta, ana cire ƙarin kayan da aka ƙara da ragowar saman. Ana sarrafa abubuwan da ke cikin sulfur, chlorine, da ions na ƙarfe masu narkewa sosai, wanda ke haifar da ƙarancin NVR (ragowar da ba ta canzawa). Wannan yana hana iskar shaka ta wafer, tsatsa mai rufewa, da lahani na ƙwanƙwasa, yana sa safar hannu ta dace da tsarin lithography mai wahala ga wafers masu inci 8 da 12.
Kariyar ESD guda 3 da aka Gyara a cikin Mold don Kare Wafers Masu Sauƙin Kula da Electrostatic
Sabanin safar hannu masu hana tsatsa da ake samu a kasuwa tare da feshi na ɗan lokaci, Gonars yana amfani da fasahar gyaran tsatsa da ke cikin mold akan kayan tushe na nitrile. Wannan yana tabbatar da juriya mai ƙarfi da daidaito, yana ci gaba da watsa wutar lantarki mai tsatsa a duk tsawon aikin don hana taruwar tsatsa da ka iya haifar da rushewar hasken photoresist da lalata da'irorin wafer masu daidaito. Ya dace da matakan lithography na asali kamar fallasa da haɓakawa.
4 Mai sassauƙa da Sannug Fit, Ya dace da Ayyukan Daidaita Micron-Level
Kayan safar hannu yana da sassauƙa kuma ya dace da siffar hannun. Yana da ƙira mai laushi mara zamewa a yatsun hannu, yana da nauyi kuma ba shi da ƙarfi, wanda hakan ya sa ya dace da ayyukan daidai kamar sarrafa wafer na photolithography, gyara kayan aiki, da duba daidaito. Yana ba da motsi mara iyaka kuma yana hana zamewa, yana rage lalacewa da kumbura masu haɗari ke haifarwa yayin aikin hannu. Bugu da ƙari, yana da juriya ga abubuwan narkewa na photolithography da acid mai laushi da alkalis, kuma yana dawwama ba tare da tsufa ko yagewa ba ko da a lokacin amfani da shi na dogon lokaci.
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✅ Marufi mai rufi biyu mai rufin injin yana kawar da gurɓatawa ta biyu
Ana tattara kayayyakin da aka gama a cikin dukkan aikin a cikin ɗakin tsafta na Class 100 ta amfani da marufi mai rufi biyu mai injin tsabtacewa, wanda ke ware su gaba ɗaya daga ƙura da danshi yayin ajiya da jigilar kaya. Babu wani gurɓataccen abu na biyu bayan buɗe marufin, wanda ke ba da damar amfani da su nan da nan a cikin ɗakunan tsaftacewa na Class 100.
Lokacin Saƙo: Yuli-23-2026